P395 – 4″ HV sputter deposition university of Braunschweig
Application
HV sputter deposition system for thin film and multilayer deposition at 4″ substrates
Year of delivery
2015
Installation site
University Braunschweig, Germany
Design Features
- HV magnetron sputter deposition system with combination of confocal and face to face sputter up configurations.
- Up to four 2″ magnetrons in confocal configuration.
- Two 2″ magnetrons with manual in situ tilting.
- Two 2″ magnetrons with fixed angle face to face setup.
- All magnetrons with easy changeable magnetic system for use with ferromagentic or non-ferromagnetic target materials.
- High power impulse magnetron sputtering (HiPIMS) possible.
- Fully motorized 2 axes sample manipulator with integrated sample shutter, DC Bias potential option and maximal sample temperature well above 800°C.
- Integrated bake out system.
- Load lock chamber with storage.
Special Features
- Two 2″ magnetrons can be used for sputtering of low melting point materials with special target pan.
- System is prepared to be added to a cluster tool via second transfer port at load lock chamber.
- System prepared for use of optical in situ layer formation observation and layer characterisation system.
Outer Dimensions
Technical specifications and performance values
General
Sputtering chamber
Size
600 mm diameter, about 800 mm height
Material
stainless steel
Load lock chamber
Size
200 mm diameter, about 300 mm height
Material
stainless steel
Vacuum
Sputtering chamber
Base pressure
< 2 * 10-8 mbar
Pump down time
1 hour to < 10-7 mbar
Chamber pumping
Turbo pumping stage, chamber lid differentially pumped by dry foreline pump
Bake out
< 150°C
Load lock chamber
Base pressure
< 5 * 10-8 mbar
Pump down time
45 minutes to < 10-7 mbar
Chamber pumping
Turbo pumping stage with dry foreline pump
Manipulator features
Sputtering chamber
Sample size
diameter max. 4″ substrate
Motion axes
2 motorized axes (manipulator z translation and (continous) rotation of the sample stage)
Pneumatic sample shutter (part of the manipulator head)
Temperatures
Room temperature (not stabilized) up to 950°C at sample
Special features
Sample bias (RF, DC or pulsed DC) is possible
Load lock chamber
(Sample storage)
Storage size
5 sample holders
Sample size
diameter max. 4″ substrate
Motion axes
2 manual axes (rotation, z tranlsation)
Rotation axis equipped with an air side idexer plate for easy and fast sample loading via access door or transfer rod
Performance test results
Chamber pump down
Long time sample heating
