P365 – 17″ HV Ion beam sputter deposition system TopTec
Application
HV ion beam sputter deposition system for thin film and multilayer deposition at 17″ substrates
Year of delivery
2013
Installation site
TopTec, Turnov, Czech Republic
Design Features
- HV Ion Beam sputter deposition system in combination with ion beam assisted deposition.
- 75mm DC ion source oriented towards a target manipulator with three 200 mm x 200 mm targets.
- Sample manipulator with motorized sample rotation, pneumatic shutter and maximal sample temperature of 300°C.
- Second ion source for sample precleaning, mild etching, plasma treatment and ion beam assisted deposition (IBAD).
Special Features
- System integration in clean room wall (door and user interface is in clean room; rest of the sytem is in gray room).
- Sample manipulator can be equipped with at least two different stage heads.
- Stage head 1 for one samples with diameter of max. 450mm (max. 25kg).
- Stage head 2 for three samples with diameter of max. 200mm diameter.
Outer Dimensions
Technical specifications and performance values
General
Sputtering chamber
Size
About 750 mm width, about 870 mm depth, about 720 mm height (D-shape chamber with door)
Material
stainless steel
Vacuum
Sputtering chamber
Base pressure
< 10-7 mbar
Pump down time
3.5 hours to < 5 *10-7 mbar
Chamber pumping
Turbo pumping stage with dry foreline pump
Manipulator features
Sputtering chamber
Sample size
Sample stage head 1: diameter max. 450 mm substrate (max. 25kg)
Sample stage head 2: three samples with diameter max. 200 mm substrate
Motion axes
max. 2 motorized axes (depending on mounted sample stage head)
Sample stage head 1: motorized (continous) sample stage rotation
Sample stage head 2: motorized (continous) sample stage rotation incl. planetary rotation at each sample
Temperatures
Room temperature (not stabilized) up to 300°C at sample
Sample preparation features
Sputtering chamber
Plasma treatment
Up to 5E-4 mbar partly ionised argon gas (using a griddless ion gun)
Ion beam etching /
sample precleaning
Wide range variation of ion energy and ion beam current
Performance test results
Chamber pump down
Long time sample heating
